| Title | Optimizing Silicon Oxide Embedded Silicon Nanocrystal Inter-particle Distances |
|---|---|
| ID_Doc | 64556 |
| Authors | van Sebille, M; Allebrandi, J; Quik, J; van Swaaij, RACMM; Tichelaar, FD; Zeman, M |
| Title | Optimizing Silicon Oxide Embedded Silicon Nanocrystal Inter-particle Distances |
| Year | 2016 |
| Published | |
| Abstract | We demonstrate an analytical method to optimize the stoichiometry and thickness of multilayer silicon oxide films in order to achieve the highest density of non-touching and closely spaced silicon nanocrystals after annealing. The probability of a nanocrystal nearest-neighbor distance within a limited range is calculated using the stoichiometry of the as-deposited film and the crystallinity of the annealed film as input parameters. Multiplying this probability with the nanocrystal density results in the density of non-touching and closely spaced silicon nanocrystals. This method can be used to estimate the best as-deposited stoichiometry in order to achieve optimal nanocrystal density and spacing after a subsequent annealing step. |
| https://nanoscalereslett.springeropen.com/track/pdf/10.1186/s11671-016-1567-6 |
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