| Title |
Extending green technology innovations to enable greener fabs |
| ID_Doc |
30061 |
| Authors |
Takahisa, K; Yoo, Y; Fukuda, H; Minegishi, Y; Enami, T |
| Title |
Extending green technology innovations to enable greener fabs |
| Year |
2015 |
| Published |
|
| DOI |
10.1117/12.2180275 |
| Abstract |
Semiconductor manufacturing industry has growing concerns over future environmental impacts as fabs expand and new generations of equipment become more powerful. Especially rare gases supply and price are one of prime concerns for operation of high volume manufacturing (HVM) fabs. Over the past year it has come to our attention that Helium and Neon gas supplies could be unstable and become a threat to HVM fabs. To address these concerns, Gigaphoton has implemented various green technologies under its EcoPhoton program. One of the initiatives is GigaTwin deep ultraviolet (DUV) lithography laser design which enables highly efficient and stable operation. Under this design laser systems run with 50% less electric energy and gas consumption compared to conventional laser designs. In 2014 we have developed two technologies to further reduce electric energy and gas efficiency. The electric energy reduction technology is called eGRYCOS (enhanced Gigaphoton Recycled Chamber Operation System), and it reduces electric energy by 15% without compromising any of laser performances. eGRYCOS system has a sophisticated gas flow design so that we can reduce cross-flow-fan rotation speed. The gas reduction technology is called eTGM (enhanced Total gas Manager) and it improves gas management system optimizing the gas injection and exhaust amount based on laser performances, resulting in 50% gas savings. The next steps in our roadmap technologies are indicated and we call for potential partners to work with us based on OPEN INNOVATION concept to successfully develop faster and better solutions in all possible areas where green innovation may exist. |
| Author Keywords |
DUV; KrF; ArF; photo-lithography; natural resources; green manufacturing; open innovation; injection-lock laser |
| Index Keywords |
Index Keywords |
| Document Type |
Other |
| Open Access |
Open Access |
| Source |
Conference Proceedings Citation Index - Science (CPCI-S) |
| EID |
WOS:000354252900069 |
| WoS Category |
Optics; Imaging Science & Photographic Technology |
| Research Area |
Optics; Imaging Science & Photographic Technology |
| PDF |
|