| Title |
Optimizing Silicon Oxide Embedded Silicon Nanocrystal Inter-particle Distances |
| ID_Doc |
64556 |
| Authors |
van Sebille, M; Allebrandi, J; Quik, J; van Swaaij, RACMM; Tichelaar, FD; Zeman, M |
| Title |
Optimizing Silicon Oxide Embedded Silicon Nanocrystal Inter-particle Distances |
| Year |
2016 |
| Published |
|
| DOI |
10.1186/s11671-016-1567-6 |
| Abstract |
We demonstrate an analytical method to optimize the stoichiometry and thickness of multilayer silicon oxide films in order to achieve the highest density of non-touching and closely spaced silicon nanocrystals after annealing. The probability of a nanocrystal nearest-neighbor distance within a limited range is calculated using the stoichiometry of the as-deposited film and the crystallinity of the annealed film as input parameters. Multiplying this probability with the nanocrystal density results in the density of non-touching and closely spaced silicon nanocrystals. This method can be used to estimate the best as-deposited stoichiometry in order to achieve optimal nanocrystal density and spacing after a subsequent annealing step. |
| Author Keywords |
Silicon nanocrystal; Silicon oxide; Inter-particle distance; Stoichiometry; Spacing |
| Index Keywords |
Index Keywords |
| Document Type |
Other |
| Open Access |
Open Access |
| Source |
Science Citation Index Expanded (SCI-EXPANDED) |
| EID |
WOS:000381296000001 |
| WoS Category |
Nanoscience & Nanotechnology; Materials Science, Multidisciplinary; Physics, Applied |
| Research Area |
Science & Technology - Other Topics; Materials Science; Physics |
| PDF |
https://nanoscalereslett.springeropen.com/track/pdf/10.1186/s11671-016-1567-6
|